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Browsing by Author "Maas, Raymond"

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    Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography

    Langner, Andreas
    ;
    Ekinci, Yasin
    ;
    Gronheid, Roel  
    ;
    Wang, Suping
    ;
    van Setten, Eelco
    Proceedings paper
    2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010

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