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Browsing by Author "Marcuccilli, Gino"

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    Detection of split design-related weak points in double patterning using PQW and bright-field defect inspection

    Van Den Heuvel, Dieter  
    ;
    Cheng, Shaunee
    ;
    Leray, Philippe  
    ;
    Wiaux, Vincent  
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    Maenhoudt, Mireille
    Proceedings paper
    2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008
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    Investigation of the performance of state-of-the-art defect inspection tools within EUV lithography

    Van Den Heuvel, Dieter  
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    Jonckheere, Rik  
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    Cheng, Shaunee
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    Marcuccilli, Gino
    ;
    Cross, Andrew  
    Proceedings paper
    2012, Metrology, Inspection, and Process Control for Microlithography XXVI, 12/02/2012, p.83240L
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    Quantitative pattern collapse metrology for 193nm immersion lithography

    Winroth, Gustaf
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    Gronheid, Roel  
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    Lin, Chua
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    Neishi, Katsumi
    ;
    Harukawa, Ryota
    ;
    Marcuccilli, Gino
    Journal article
    2011, Journal of Photopolymer Science and Technology, (24) 2, p.233-238

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