Browsing by Author "Matsuda, Takashi"
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Publication A methodology for double patterning compliant split and design
Proceedings paper2008, SPIE Lithography Asia, 4/11/2008, p.71401XPublication Alternative process schemes for double patterning that eliminate the intermediate etch step
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.69240PPublication Split and design guidelines for double patterning
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.692409