imec Institutional Repository Browsing {{ collection }} by Author "Meliorisz, Balint"

Publication

Calibrated PSCAR stochastic simulation

Dinh, Cong Que

;

Nagahara, Seji

;

Shiraishi, Gousuke

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Minekawa, Yukie

;

Kamei, Yuya

Proceedings paper

2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109571O

Publication

Increasing the predictability of AIMS measurements by coupling to resist simulations

Meliorisz, Balint

;

Erdmann, Andreas

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Schnattinger, Thomas

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Strössner, Ulrich

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Scherübl, Thomas

Proceedings paper

2008, Photomask and Next-Generation Lithography Mask Technology XV, 16/04/2008, p.70282S

Publication

Mask aligner lithography simulation

Duval, Fabrice

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Meliorisz, Balint

;

Slabbekoorn, John

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Maenhoudt, Mireille

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Miller, Andy

Oral presentation

2010, 54th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication

Publication

Mask aligner lithography simulation

Duval, Fabrice

;

Miller, Andy

;

Slabbekoorn, John

;

Maenhoudt, Mireille

;

Meliorisz, Balint

Meeting abstract

2010, 54th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication, 1/06/2010

Browsing by Author "Meliorisz, Balint"