Browsing by Author "Melvin, Lawrence"
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Publication Calibrated Modeling of Line-to-Line Dielectric Reliability: LER Specs to Meet Reliability Constraints at Operating Conditions
Meeting abstract2019, 26th Lithography Workshop, 3/11/2019, p.50Publication Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.105830OPublication Exploration of etch step interactions in the dual patterning process for process modeling
Journal article2008, Journal of Vacuum Science and Technology B, (26) 6, p.2434-2434Publication Flare mitigation strategies in extreme ultraviolet lithography
Journal article2008, Microelectronic Engineering, (85) 5_6, p.738-743Publication Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithograpgy VIII, 26/02/2017, p.101430IPublication Stochastic printing behavior of ML-defects on EUV mask
Proceedings paper2019-09, International Conference on Extreme Ultraviolet Lithography 2019, 16/09/2019, p.111470P