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Conference contributions
Stochastic printing behavior of ML-defects on EUV mask
Publication:
Stochastic printing behavior of ML-defects on EUV mask
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Date
2019-09
Proceedings Paper
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43145.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jonckheere, Rik
;
Melvin, Lawrence
;
Capelli, Renzo
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1971
since deposited on 2021-10-27
1
last month
Acq. date: 2025-12-10
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Metrics
Views
1971
since deposited on 2021-10-27
1
last month
Acq. date: 2025-12-10
Citations