Repository logo Institutional repository
  • Communities & Collections
  • Scientific publicationsOpen knowledge
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Melvin, Lawrence, III"

Filter results by typing the first few letters
Now showing 1 - 2 of 2
  • Results per page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Contribution of mask roughness in stochasticity of high-NA EUV imaging

    Jonckheere, Rik  
    ;
    Melvin, Lawrence, III
    Proceedings paper
    2021-11, International Conference on Extreme Ultraviolet Lithography, SEP 27-OCT 01, 2021
  • Loading...
    Thumbnail Image
    Publication

    Does high-NA EUV require tighter mask roughness specifications: a simulation study

    Jonckheere, Rik  
    ;
    Melvin, Lawrence, III
    Proceedings paper
    2022, International Conference on Extreme Ultraviolet Lithography, SEP 26-29, 2022

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings