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Conference contributions
Contribution of mask roughness in stochasticity of high-NA EUV imaging
Publication:
Contribution of mask roughness in stochasticity of high-NA EUV imaging
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Date
2021-11
Proceedings Paper
https://doi.org/10.1117/12.2601897
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euvl2021_11854-50_Jonckheere_fin2.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jonckheere, Rik
;
Melvin, Lawrence, III
Journal
SPIE proceedings
Abstract
Description
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Acq. date: 2025-12-13
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Downloads
626
since deposited on 2022-05-22
124
last month
6
last week
Acq. date: 2025-12-13
Views
1672
since deposited on 2022-05-22
1
last month
Acq. date: 2025-12-13
Citations