Publication:

Contribution of mask roughness in stochasticity of high-NA EUV imaging

Date

2021-11
Proceedings Paper
https://doi.org/10.1117/12.2601897
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dc.contributor.authorJonckheere, Rik
dc.contributor.authorMelvin, Lawrence, III
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2022-06-28T14:30:07Z
dc.date.available2022-05-22T02:19:06Z
dc.date.available2022-06-03T10:30:15Z
dc.date.available2022-06-28T14:30:07Z
dc.date.issued2021-11
dc.identifier.doi10.1117/12.2601897
dc.identifier.eisbn978-1-5106-4553-0
dc.identifier.isbn978-1-5106-4552-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39871
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 27-OCT 01, 2021
dc.source.conferencelocationMonterey
dc.source.journalSPIE proceedings
dc.source.numberofpages11
dc.source.volume11854
dc.title

Contribution of mask roughness in stochasticity of high-NA EUV imaging

dc.typeProceedings paper
dspace.entity.typePublication
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