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Browsing by Author "Montgomery, P.K."

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    Resist reflow for 193-nm low-K1 lithography contacts

    Montgomery, P.K.
    ;
    Lucas, K.
    ;
    Strozewski, K.J.
    ;
    Zavyalova, L.
    ;
    Grozev, Grozdan  
    ;
    Reybrouck, Mario  
    Proceedings paper
    2003, Advances in Resist Technology an Processing XX, 23/02/2003, p.807-816

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