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Resist reflow for 193-nm low-K1 lithography contacts
Publication:
Resist reflow for 193-nm low-K1 lithography contacts
Date
2003
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Montgomery, P.K.
;
Lucas, K.
;
Strozewski, K.J.
;
Zavyalova, L.
;
Grozev, Grozdan
;
Reybrouck, Mario
;
Tzviatkov, P.
;
Maenhoudt, Mireille
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1931
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1931
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations