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Browsing by Author "Mulders, Thomas"

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    Experimental characterization of NTD rResist shrinkage

    Kuchler, Bernd
    ;
    Mulders, Thomas
    ;
    Taoka, Hironobu
    ;
    Gao, Weimin  
    ;
    Klostermann, Ulrich
    Proceedings paper
    2017, Optical Microlithography XXX, 26/02/2017, p.101470F
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    Source-mask optimization incorporating a physical resist model and manufacturability constraints

    Mulders, Thomas
    ;
    Domnenko, Vitaliy
    ;
    Kuechler, Bernd
    ;
    Stock, Hans-Juergen
    ;
    Klostermann, Ulrich
    Proceedings paper
    2012, Optical Microlithography XXV, 12/02/2012, p.83260G

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