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Conference contributions
Source-mask optimization incorporating a physical resist model and manufacturability constraints
Publication:
Source-mask optimization incorporating a physical resist model and manufacturability constraints
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Date
2012
Proceedings Paper
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24712.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mulders, Thomas
;
Domnenko, Vitaliy
;
Kuechler, Bernd
;
Stock, Hans-Juergen
;
Klostermann, Ulrich
;
De Bisschop, Peter
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1878
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Acq. date: 2025-12-11
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Metrics
Views
1878
since deposited on 2021-10-20
2
last month
Acq. date: 2025-12-11
Citations