Browsing by Author "Muller, D."
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Publication Nucleation and growth of atomic layer deposited HfO2 gate dielectric layers on chemical oxide (Si-O-H) and thermal oxide (SiO2 or Si-O-N)
Journal article2002, Journal of Applied Physics, (92) 12, p.7168-7172Publication Slim-cut technology using epoxy layer for photovoltaic application
;Bellanger, Pierre ;Muller, D. ;Roques, S. ;Le Gall, Y. ;Slaoui, A. ;Serra, J.M.Ulyashin, A.G.Oral presentation2016, PV Days