Browsing by Author "Nakashima, Hideo"
Now showing 1 - 1 of 1
- Results Per Page
- Sort Options
Publication Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure
;Nagahara, Seiji ;Carcasi, Michael ;Shiraishi, Gosuke ;Nakagawa, HisashiDei, SatoshiProceedings paper2017, Advances in Patterning Materials and Processes XXXIV, 26/02/2017, p.101460G