Browsing by Author "Neureuther, A. R."

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Massively parallel electromagnetic simulation for photolithographic applications

Wong, Alfred
;
Guerrieri, R.
;
Neureuther, A. R.
Journal article
1995, IEEE Trans. Computer-Aided Design of Integrated Circuits and Systems, 14, p.1231-1240
Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications

Wong, Alfred
;
Neureuther, A. R.
Journal article
1995, IEEE Trans. Semiconductor Manufacturing, (8) 4, p.419-431