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Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications
Publication:
Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications
Date
1995
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wong, Alfred
;
Neureuther, A. R.
Journal
IEEE Trans. Semiconductor Manufacturing
Abstract
Description
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1923
since deposited on 2021-09-29
416
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Acq. date: 2025-10-24
Citations
Metrics
Views
1923
since deposited on 2021-09-29
416
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations