Browsing by Author "Noori, Atif"
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Publication Integration of 20nm half pitch single damascene copper trenches by spacer-defined double patterning (SDDP) on metal hard mask (MHM)
; ; ; ; Proceedings paper2010, IEEE International Interconnect Technology Conference - IITC, 7/06/2010Publication Manufacturable processes for =32-nm-node CMOS enhancement by synchronous optimization of strain-engineered channel and external parasitic resistances
Journal article2008, IEEE Transactions on Electron Devices, (55) 5, p.1259-1264Publication Spacer defined double patterning for 20nm half pitch interconnect damascene structures
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