Browsing by Author "Ohtomi, Eisuke"
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Publication Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 044801Publication Resist line edge roughness mitigation for high-NA EUVL
Proceedings paper2022, Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2022, p.120550K