Browsing by Author "Oorschot, Dorothe"
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Publication Edge placement error analysis for N7 logic patterning options
Publication LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics
Proceedings paper2024, 2024 International Conference on Extreme Ultraviolet Lithography, SEP 30-OCT 03, 2024, p.Art. 132150Q