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Browsing by Author "Otto, O."

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    Feature biasing versus feature-assisted lithography. A comparison of proximity correction methods for 0.5*(l/NA) lithography

    Pforr, Rainer
    ;
    Wong, Alfred
    ;
    Ronse, Kurt  
    ;
    Van den hove, Luc  
    ;
    Yen, Anthony
    ;
    Palmer, S.
    ;
    Fuller, G.
    Proceedings paper
    1995, Optical Laser Microlithography VIII, 22/02/1995, p.150-170
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    Optical proximity correction for 0.3 μm i-line lithography

    Yen, Anthony
    ;
    Tzviatkov, Plamen
    ;
    Wong, Alfred
    ;
    Juffermans, Casper
    ;
    Jonckheere, Rik  
    Journal article
    1996, Microelectronic Engineering, 30, p.141-144

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