Browsing by Author "Panaite, Petrisor"

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Co-Optimized Double-Exposure Stitching with ILT to Maximize High-NA EUV Process Window

Dam, Thuc
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Painter, Benjamin
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Taneja, Ankur
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Selinidis, Kosta
;
Abdelghany, Hesham
;
Zhou, Xiangyu
Proceedings paper
2026, DTCO and Computational Patterning V, 2026-02-22, p.139800G
Printability verification for double-patterning technology

Luk-Pat, Gerard
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Panaite, Petrisor
;
Lucas, Kevin
;
Cork, Christopher
;
Wiaux, Vincent
Proceedings paper
2008, Photomask Technology 2008, 6/10/2008, p.71220Q