Browsing by Author "Paniez, P."
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Publication Lithographic performance of 193 nm resist
Proceedings paper1998, 193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book, 14/09/1998, p.P-020Publication Robust and environmentally stable deep UV positive resist: optimization of SUCCESS ST2
;Schwalm, R. ;Binder, H. ;Fischer, T. ;Funhoff, D. ;Goethals, Mieke ;Grassmann, A.Moritz, H.Proceedings paper1994, Advances in Resist Technology and Processing XI, 27/02/1994, p.2-13