Browsing by Author "Pavel, E."
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Publication Novel patterning shrink technique enabling sub-50nm trench and contact integration
Proceedings paper2007, International Symposium on Semiconductor Manufacturing, 15/10/2007Publication The effect of delay between dry etch and wet clean processing steps on cleaning of post-etch residues
Proceedings paper2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.283-290