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Browsing by Author "Payne, Makonnen"

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    Evaluation of post etch residue cleaning solutions for the removal of TiN hardmask after dry etch of low-k dielectric materials on 45 nm pitch interconnects

    Payne, Makonnen
    ;
    Lippy, Steve
    ;
    Lieten, Ruben  
    ;
    Kesters, Els  
    ;
    Le, Quoc Toan  
    ;
    Murdoch, Gayle  
    Proceedings paper
    2016, Ultra Clean Processing of Semiconductor Surfaces XIII - UCPSS, 11/09/2016, p.2323-236

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