Browsing by Author "Raptis, I."
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Publication Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness
;Drygianakis, D. ;Nijkerk, M.D. ;Patsis, G.P. ;Kokkoris, G. ;Raptis, I.Leunissen, PeterProceedings paper2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65193T