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Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness
Publication:
Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness
Date
2007
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Drygianakis, D.
;
Nijkerk, M.D.
;
Patsis, G.P.
;
Kokkoris, G.
;
Raptis, I.
;
Leunissen, Peter
;
Gogolides, E.
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1872
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1872
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations