Publication:
Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness
Date
| dc.contributor.author | Drygianakis, D. | |
| dc.contributor.author | Nijkerk, M.D. | |
| dc.contributor.author | Patsis, G.P. | |
| dc.contributor.author | Kokkoris, G. | |
| dc.contributor.author | Raptis, I. | |
| dc.contributor.author | Leunissen, Peter | |
| dc.contributor.author | Gogolides, E. | |
| dc.date.accessioned | 2021-10-16T15:57:01Z | |
| dc.date.available | 2021-10-16T15:57:01Z | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12104 | |
| dc.source.beginpage | 65193T | |
| dc.source.conference | Advances in Resist Materials and Processing Technology XXIV | |
| dc.source.conferencedate | 25/02/2007 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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