Browsing by Author "Rezvanov, A."
Now showing 1 - 3 of 3
- Results Per Page
- Sort Options
Publication Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)
Journal article2015, Electronic Engineering, 3, p.49Publication Adsorption isobars of fluorocarbon compounds selected for cryogenic etching of low-k materials
Meeting abstract2015, Spring MRS Meeting Symposium BB: Innovative Interconnects/Electrodes for Advances Devices, Flexible and Green Energy Electronics, 6/04/2015, p.BB2.03Publication Investigation of plasma damage of low-k dielectrics during cryogenic etching