Browsing by Author "Riedel, T."
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Publication Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processor
Proceedings paper2000, Cleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium, 17/10/1999, p.204-11Publication From Piranha to Barracuda: mechanism of ozone and water vapor photoresistant strip in a wet bench
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.227-230