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Browsing by Author "Rieger, M."

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    Optical proximity effects correction at 0.25 mm incorporating process variations in lithography

    Tritchkov, Alexander
    ;
    Rieger, M.
    ;
    Stirniman, J.
    ;
    Yen, Anthony
    ;
    Ronse, Kurt  
    ;
    Vandenberghe, Geert  
    Proceedings paper
    1997, Optical Microlithography X, 12/03/1997, p.726-738

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