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Optical proximity effects correction at 0.25 mm incorporating process variations in lithography
Publication:
Optical proximity effects correction at 0.25 mm incorporating process variations in lithography
Date
1997
Proceedings Paper
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2163.pdf
1.87 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tritchkov, Alexander
;
Rieger, M.
;
Stirniman, J.
;
Yen, Anthony
;
Ronse, Kurt
;
Vandenberghe, Geert
;
Van den hove, Luc
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1955
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations
Metrics
Views
1955
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations