Browsing by Author "Rittersma, Z.M."
Now showing 1 - 3 of 3
- Results Per Page
- Sort Options
Publication Band alignment at the interface of (100)Si with HfxTa1-xOy high-k dielectric layers
Journal article2005, Applied Physics Letters, (86) 7, p.072108-1-072108-3Publication Band alignment between (100)Si and Hf-based complex metal oxides
Journal article2005, Microelectronic Engineering, (80) 80, p.102-105Publication Properties of HfTaxOy high-k layers deposited by ALCVD
;Zhao, Chao ;Rittersma, Z.M. ;van Berkum, J.G.M. ;Snijders, J.H.M. ;Hendriks, A.Breimer, P.Proceedings paper2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.133-140