Browsing by Author "Robertson, Stewart"
Now showing 1 - 8 of 8
- Results per page
- Sort Options
Publication A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275003Publication Characterization of a thermal freeze LLE double patterning process for predictive simulation
Proceedings paper2010, International Symposium on Lithography Extensions, 20/10/2010Publication Comparative stochastic process variation bands for N7, N5, and N3 at EUV
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 12/02/2018, p.105830KPublication Interactions between imaging layers during LPLE double patterning lithography
Proceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.83260BPublication Investigation of litho1-litho2 proximity differences for a LPLE double patterning process
Proceedings paper2011, International Symposium on Lithography Extensions - EUVL, 20/10/2011Publication Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes
Proceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.83260EPublication Modelling the lithography of ion implantation resists on topography
Proceedings paper2014, Optical Microlithography XXVII, 23/02/2014, p.90520ZPublication Statistical simulation of resist at EUV and ArF
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727319