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    Improved sidewall doping with small implant angle by AsH3 Ion assisted deposition and doping process for scaled NMOS Si bulk FinFETs

    Sasaki, Yuichiro
    ;
    Godet, Ludovic
    ;
    Chiarella, Thomas  
    ;
    Brunco, David
    ;
    Rockwell, Tyler
    ;
    Lee, Jae Woo
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.542-545

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