Publication:

Improved sidewall doping with small implant angle by AsH3 Ion assisted deposition and doping process for scaled NMOS Si bulk FinFETs

Date

2013

Proceedings Paper

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Files

27453.pdf 1.02 MB

Author(s)

Sasaki, Yuichiro

;

;

Chiarella, Thomas

;

;

Rockwell, Tyler

;

;

Colombeau, Benjamin

;

Togo, Mitsuhiro

;

;

Zschaetzsch, Gerd

;

Noh, Kyung Bong

;

De Keersgieter, An

;

Boccardi, Guillaume

;

;

Hellings, Geert

;

Martin, Patrick

;

Vandervorst, Wilfried

;

;

Horiguchi, Naoto

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