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Improved sidewall doping with small implant angle by AsH3 Ion assisted deposition and doping process for scaled NMOS Si bulk FinFETs

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1919 since deposited on 2021-10-21
Acq. date: 2025-10-23

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1919 since deposited on 2021-10-21
Acq. date: 2025-10-23

Citations