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Browsing by Author "Rosenbusch, A."

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    Application of a new approach to optical proximity correction

    Rosenbusch, A.
    ;
    Hourd, A.
    ;
    Juffermans, Casper
    ;
    Kirsch, H.
    ;
    Lalanne, F.
    ;
    Maurer, W.
    ;
    Romeo, C.
    Proceedings paper
    1999, Optical Microlithography XII, 17/03/1999, p.639-647
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    Hierarchical E-beam proximity correction in mask making

    Hofmann, U.
    ;
    Kalus, C.
    ;
    Rosenbusch, A.
    ;
    Jonckheere, Rik  
    ;
    Hourd, A.
    Proceedings paper
    1996, Electrtron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, 11/03/1996, p.150-158
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    New approach to optical proximity correction

    Rosenbusch, A.
    ;
    Hourd, A.
    ;
    Juffermans, C.
    ;
    Kirsch, H.
    ;
    Lalanne, F.
    ;
    Maurer, W.
    ;
    Romeo, C.
    ;
    Ronse, Kurt  
    Proceedings paper
    1998, 18th Annual Bacus Symposium on Photomask Technology and Management, 16/09/1998, p.585-593

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