Browsing by Author "Schatz, Jirka"
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Publication High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print
Proceedings paper2025, Photomask Technology, 2025-09-22, p.1368713Publication High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation