Publication:

High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3078279
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Author(s)

Bekaert, Joost  
;
Schatz, Jirka
;
Hosoya, Sotaro
;
Komami, Hideaki
;
Roy, Syamashree  
;
Libeert, Guillaume  
;
Baskaran, Balakumar  
;
Philipsen, Vicky  
;
Hendrickx, Eric  
;
Trivkovic, Darko  
;
Welling, Ulrich
;
Tomizuka, Shosuke
;
Yamaji, Masataka
;
Tomita, Tatsuya
;
Fujii, Nobuaki
;
Yoshikawa, Shingo
;
Nakaya, Hideki
;
Iwai, Toshimichi
;
Okawa, Tatsuro
;
Ito, Wataru
;
Kojima, Shinichi

Journal

PHOTOMASK TECHNOLOGY 2025

Abstract

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10 since deposited on 2026-03-31
3last month
Acq. date: 2026-08-05

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10 since deposited on 2026-03-31
3last month
Acq. date: 2026-08-05

Citations