Publication:
High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print
| dc.contributor.author | Bekaert, Joost | |
| dc.contributor.author | Schatz, Jirka | |
| dc.contributor.author | Hosoya, Sotaro | |
| dc.contributor.author | Komami, Hideaki | |
| dc.contributor.author | Roy, Syamashree | |
| dc.contributor.author | Libeert, Guillaume | |
| dc.contributor.author | Baskaran, Balakumar | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.author | Trivkovic, Darko | |
| dc.contributor.author | Welling, Ulrich | |
| dc.contributor.author | Tomizuka, Shosuke | |
| dc.contributor.author | Yamaji, Masataka | |
| dc.contributor.author | Tomita, Tatsuya | |
| dc.contributor.author | Fujii, Nobuaki | |
| dc.contributor.author | Yoshikawa, Shingo | |
| dc.contributor.author | Nakaya, Hideki | |
| dc.contributor.author | Iwai, Toshimichi | |
| dc.contributor.author | Okawa, Tatsuro | |
| dc.contributor.author | Ito, Wataru | |
| dc.date.accessioned | 2026-03-31T08:02:41Z | |
| dc.date.available | 2026-03-31T08:02:41Z | |
| dc.date.createdwos | 2026-02-20 | |
| dc.date.issued | 2025 | |
| dc.description.wosFundingText | This paper received the best presentation award at the 40th European Mask and Lithography Conference (EMLC, 2025). Consequently, this paper is a re-publication of the earlier paper. [15] The authors gratefully acknowledge the contributions from Rik Jonckheere, Gunther Sterckx, Kenichi Miyaguchi, Lieve Van Look, Jad Haddad, Andreas Frommhold, and Jeroen Van de Kerkhove from imec, and Stuart Ainslie, Naoyuki Koyama, Kristian Kralik, Thomas Kippenberg, Niklas Kerndl, Yoshiaki Ogiso, and Johannes Rehli from Advantest, and Denis Ponomarenco and John Jomo from Synopsys. Finally, we want to express our appreciation towards the imec mask partners for their continued support in imec's partner program on advanced patterning. This work has been enabled in part by the Nano IC project funded by the European Union. | |
| dc.identifier.doi | 10.1117/12.3078279 | |
| dc.identifier.isbn | 978-1-5106-9320-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/58979 | |
| dc.language.iso | eng | |
| dc.provenance.editstepuser | greet.vanhoof@imec.be | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 1368713 | |
| dc.source.conference | Photomask Technology | |
| dc.source.conferencedate | 2025-09-22 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | PHOTOMASK TECHNOLOGY 2025 | |
| dc.source.numberofpages | 11 | |
| dc.title | High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| imec.internal.crawledAt | 2026-02-23 | |
| imec.internal.source | crawler | |
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