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Browsing by Author "Scherübl, Thomas"

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    Impact of alternative mask stacks on the imaging performance at NA 1.20 and above

    Philipsen, Vicky  
    ;
    Mesuda, Kei
    ;
    De Bisschop, Peter  
    ;
    Erdmann, Andreas
    ;
    Citarella, Giuseppe
    Proceedings paper
    2007, SPIE Photomask Technology (BACUS), 18/09/2007, p.67301N
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    Increasing the predictability of AIMS measurements by coupling to resist simulations

    Meliorisz, Balint
    ;
    Erdmann, Andreas
    ;
    Schnattinger, Thomas
    ;
    Strössner, Ulrich
    ;
    Scherübl, Thomas
    Proceedings paper
    2008, Photomask and Next-Generation Lithography Mask Technology XV, 16/04/2008, p.70282S
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    Using the AIMS 45-193i for hyper-NA imaging applications

    De Bisschop, Peter  
    ;
    Philipsen, Vicky  
    ;
    Birkner, Robert
    ;
    Buttgereit, Uwe
    ;
    Richter, Rigo
    Proceedings paper
    2007, SPIE Photomask Technology (BACUS), 18/09/2007, p.67301G

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