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Browsing by Author "Scheruebl, Thomas"

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    AIMS TM 45 inspection of CH treated with inverse lithography

    Hendrickx, Eric  
    ;
    Birkner, Robert
    ;
    Kempsell, Monica
    ;
    Tritchkov, Alexander
    ;
    Richter, Rigo
    Proceedings paper
    2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008
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    Application of pixel-based mask optimization technique for high-transmission attenuated PSM

    Sakajiri, Kyohei
    ;
    Tritchkov, Alexander
    ;
    Granik, Yuri
    ;
    Hendrickx, Eric  
    ;
    Vandenberghe, Geert  
    Proceedings paper
    2009, Design for Manufacturability through Design-Process Integration III, 22/02/2009, p.72750X
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    Test of vector effect emulation of the AIMSTM45-193i

    De Bisschop, Peter  
    ;
    Philipsen, Vicky  
    ;
    Birkner, Robert
    ;
    Richter, Rigo
    ;
    Scheruebl, Thomas
    Oral presentation
    2007, 4th International Immersion Lithography Symposium

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