imec Institutional Repository Browsing {{ collection }} by Author "Schiavone, P."

Publication

Application of a new approach to optical proximity correction

Rosenbusch, A.

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Hourd, A.

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Juffermans, Casper

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Kirsch, H.

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Lalanne, F.

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Maurer, W.

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Romeo, C.

Proceedings paper

1999, Optical Microlithography XII, 17/03/1999, p.639-647

Publication

New approach to optical proximity correction

Rosenbusch, A.

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Hourd, A.

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Juffermans, C.

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Kirsch, H.

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Lalanne, F.

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Maurer, W.

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Romeo, C.

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Ronse, Kurt

Proceedings paper

1998, 18th Annual Bacus Symposium on Photomask Technology and Management, 16/09/1998, p.585-593

Publication

Status of UV2 Litho project : Usable Vacuum Ultra Violet Lithography

Goethals, Mieke

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Jonckheere, Rik

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Van Roey, Frieda

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Hermans, Jan

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Van Den Heuvel, Dieter

Meeting abstract

2003-08, 4th International Symposium on 157nm Lithography, 25/08/2003

Publication

UV2Litho: usable vacuum ultra violet lithography

Goethals, Mieke

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Jonckheere, Rik

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Van Roey, F.

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Hermans, J.

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Eliat, Astrid

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Ronse, Kurt

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Wong, P.

Oral presentation

2002, 3th International Symposium on 157nm Lithography

Browsing by Author "Schiavone, P."