Repository logo Institutional repository
  • Communities & Collections
  • Browse
  • Site
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Schild, R."

Filter results by typing the first few letters
Now showing 1 - 4 of 4
  • Results Per Page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Elimination of HF-last cleaning related CoSi2 defects formation

    Zou, Gang
    ;
    Jonckx, Franky
    ;
    Alves Donaton, Ricardo
    ;
    Kuper, Werner
    ;
    Maex, Karen  
    ;
    Mertens, Paul  
    Proceedings paper
    1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.177-180
  • Loading...
    Thumbnail Image
    Publication

    Marangoni drying: a new concept for drying silicon wafers

    Schild, R.
    ;
    Locke, Klaus
    ;
    Kozak, M.
    ;
    Heyns, Marc  
    Proceedings paper
    1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.31-34
  • Loading...
    Thumbnail Image
    Publication

    New drying techology for advanced cleaning in IC manufacturing

    Meuris, Marc  
    ;
    Mertens, Paul  
    ;
    Schmidt, Harald
    ;
    Hurd, Trace
    ;
    Li, Li
    ;
    Heyns, Marc  
    ;
    Jonckx, Franky
    Proceedings paper
    1994, Vacuum and Semiconductor Processing Conference, 15/06/1994
  • Loading...
    Thumbnail Image
    Publication

    The IMEC-Clean: A new, highly efficient cleaning and drying technique for Si wafers

    Heyns, Marc  
    ;
    Maex, Karen  
    ;
    Schild, R.
    Journal article
    1995, Semiconductor Fabtech, 3, p.213-216

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings