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New drying techology for advanced cleaning in IC manufacturing
Publication:
New drying techology for advanced cleaning in IC manufacturing
Date
1994
Proceedings Paper
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16433.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Meuris, Marc
;
Mertens, Paul
;
Schmidt, Harald
;
Hurd, Trace
;
Li, Li
;
Heyns, Marc
;
Jonckx, Franky
;
Maex, Karen
;
Schild, R.
;
Locke, K.
;
Kozak, M.
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2084
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
Metrics
Views
2084
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations