Publication:

New drying techology for advanced cleaning in IC manufacturing

Date

1994
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorSchmidt, Harald
dc.contributor.authorHurd, Trace
dc.contributor.authorLi, Li
dc.contributor.authorHeyns, Marc
dc.contributor.authorJonckx, Franky
dc.contributor.authorMaex, Karen
dc.contributor.authorSchild, R.
dc.contributor.authorLocke, K.
dc.contributor.authorKozak, M.
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-29T12:54:44Z
dc.date.available2021-09-29T12:54:44Z
dc.date.embargo9999-12-31
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/483
dc.source.conferenceVacuum and Semiconductor Processing Conference
dc.source.conferencedate15/06/1994
dc.source.conferencelocationMünchen Germany
dc.title

New drying techology for advanced cleaning in IC manufacturing

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
16433.pdf
Size:
66.76 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions