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Browsing by Author "Schram, T."

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    On the thermal stability of Atomic Layer Deposition (ALD) TiN as gate electrode in MOS devices

    Westlinder, J.
    ;
    Schram, T.
    ;
    Pantisano, Luigi
    ;
    Cartier, Eduard
    ;
    Kerber, Andreas
    ;
    Lujan, Guilherme
    Oral presentation
    2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISC

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