Publication:
On the thermal stability of Atomic Layer Deposition (ALD) TiN as gate electrode in MOS devices
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1950 since deposited on 2021-10-15
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Acq. date: 2025-12-15
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Views
1950 since deposited on 2021-10-15
1last month
1last week
Acq. date: 2025-12-15
Citations