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On the thermal stability of Atomic Layer Deposition (ALD) TiN as gate electrode in MOS devices
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1955 since deposited on 2021-10-15
1last month
Acq. date: 2026-02-24
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Statistics
Views
1955 since deposited on 2021-10-15
1last month
Acq. date: 2026-02-24
Citations