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Browsing by Author "Sears, Monica"

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    Publication

    Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing

    Sah, Kaushik
    ;
    Cross, Andrew
    ;
    Das, Sayantan  
    ;
    Fallica, Roberto  
    ;
    Lee, Jeonghoon  
    ;
    Kim, Ryan Ryoung han
    Proceedings paper
    2022, International Conference on Extreme Ultraviolet Lithography, SEP 26-29, 2022, p.Art. 122920W

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