Browsing by Author "Sekiguchi, Kohei"
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Publication A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography
Proceedings paper2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72722EPublication Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Publication Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Publication Further study on the verification of CD-SEM based monitoring for hyper NA lithography
Proceedings paper2008, Metrology, Inspection, and Process Control for Microlithography XXII, 24/02/2008, p.69222OPublication MuGFET Observation and CD measurement by using CD-SEM
Publication Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography
Journal article2010, Journal of Micro/Nanolithography MEMS and MOEMS, (9) 4, p.41308